NEWS AND VIEWS
Bei Zhao1 and Xidong Duan2,
Corresponding author: Xidong Duan, xidongduan@hnu.edu.cn
| [1] |
Liu Y, Guo J, Zhu E B, et al. Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions. Nature, 2018, 557(7707): 696 doi: 10.1038/s41586-018-0129-8
|
| [2] |
Kwon G, Choi Y H, Lee H, et al. Interaction- and defect-free van der Waals contacts between metals and two-dimensional semiconductors. Nat Electron, 2022, 5(4): 241 doi: 10.1038/s41928-022-00746-6
|
| [3] |
Chu C H, Lin H C, Yeh C H, et al. End-bonded metal contacts on WSe2 field-effect transistors. ACS Nano, 2019, 13(7): 8146 doi: 10.1021/acsnano.9b03250
|
| [4] |
Xiao J K, Kang Z, Liu B S, et al. Record-high saturation current in end-bond contacted monolayer MoS2 transistors. Nano Res, 2022, 15(1): 475 doi: 10.1007/s12274-021-3504-y
|
| [5] |
Wang Y, Kim J C, Wu R J, et al. Van der Waals contacts between three-dimensional metals and two-dimensional semiconductors. Nature, 2019, 568(7750): 70 doi: 10.1038/s41586-019-1052-3
|
| [6] |
Wang Y, Kim J C, Li Y, et al. P-type electrical contacts for 2D transition-metal dichalcogenides. Nature, 2022, 610(7930): 61 doi: 10.1038/s41586-022-05134-w
|
| [7] |
Shen P C, Su C, Lin Y X, et al. Ultralow contact resistance between semimetal and monolayer semiconductors. Nature, 2021, 593(7858): 211 doi: 10.1038/s41586-021-03472-9
|
| [8] |
English C D, Shine G, Dorgan V E, et al. Improved contacts to MoS2 transistors by ultra-high vacuum metal deposition. Nano Lett, 2016, 16(6): 3824 doi: 10.1021/acs.nanolett.6b01309
|
| [9] |
Gao L, Chen Z Y, Fang Z H, et al. Atomic layer bonding contacts in two-dimensional semiconductors. Science, 2025, 390(6775): 813 doi: 10.1126/science.adz2405
|
| [1] |
Liu Y, Guo J, Zhu E B, et al. Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions. Nature, 2018, 557(7707): 696 doi: 10.1038/s41586-018-0129-8
|
| [2] |
Kwon G, Choi Y H, Lee H, et al. Interaction- and defect-free van der Waals contacts between metals and two-dimensional semiconductors. Nat Electron, 2022, 5(4): 241 doi: 10.1038/s41928-022-00746-6
|
| [3] |
Chu C H, Lin H C, Yeh C H, et al. End-bonded metal contacts on WSe2 field-effect transistors. ACS Nano, 2019, 13(7): 8146 doi: 10.1021/acsnano.9b03250
|
| [4] |
Xiao J K, Kang Z, Liu B S, et al. Record-high saturation current in end-bond contacted monolayer MoS2 transistors. Nano Res, 2022, 15(1): 475 doi: 10.1007/s12274-021-3504-y
|
| [5] |
Wang Y, Kim J C, Wu R J, et al. Van der Waals contacts between three-dimensional metals and two-dimensional semiconductors. Nature, 2019, 568(7750): 70 doi: 10.1038/s41586-019-1052-3
|
| [6] |
Wang Y, Kim J C, Li Y, et al. P-type electrical contacts for 2D transition-metal dichalcogenides. Nature, 2022, 610(7930): 61 doi: 10.1038/s41586-022-05134-w
|
| [7] |
Shen P C, Su C, Lin Y X, et al. Ultralow contact resistance between semimetal and monolayer semiconductors. Nature, 2021, 593(7858): 211 doi: 10.1038/s41586-021-03472-9
|
| [8] |
English C D, Shine G, Dorgan V E, et al. Improved contacts to MoS2 transistors by ultra-high vacuum metal deposition. Nano Lett, 2016, 16(6): 3824 doi: 10.1021/acs.nanolett.6b01309
|
| [9] |
Gao L, Chen Z Y, Fang Z H, et al. Atomic layer bonding contacts in two-dimensional semiconductors. Science, 2025, 390(6775): 813 doi: 10.1126/science.adz2405
|
Article views: 418 Times PDF downloads: 130 Times Cited by: 0 Times
Received: 31 January 2026 Revised: Online: Accepted Manuscript: 27 February 2026Uncorrected proof: 27 February 2026Published: 21 April 2026
| Citation: |
Bei Zhao, Xidong Duan. Bonding at the atomic limit: redefining contacts in two-dimensional semiconductors[J]. Journal of Semiconductors, 2026, 47(4): 040401. doi: 10.1088/1674-4926/26010050
****
B Zhao and X D Duan, Bonding at the atomic limit: redefining contacts in two-dimensional semiconductors[J]. J. Semicond., 2026, 47(4): 040401 doi: 10.1088/1674-4926/26010050
|
Bei Zhao received her Ph.D. degree (2021) in Physical Chemistry from Hunan University. She is currently a professor at the School of Physics, Southeast University. Her research focuses on wafer-scale controllable synthesis of novel two-dimensional materials, their damage-free transfer and integration
Xidong Duan received his Ph.D. degree from the Hunan University in 2016. He is now a professor at Hunan University, China. His research focuses on two-dimensional materials and their heterostructures, encompassing their preparation, physical properties, and applications| [1] |
Liu Y, Guo J, Zhu E B, et al. Approaching the Schottky–Mott limit in van der Waals metal–semiconductor junctions. Nature, 2018, 557(7707): 696 doi: 10.1038/s41586-018-0129-8
|
| [2] |
Kwon G, Choi Y H, Lee H, et al. Interaction- and defect-free van der Waals contacts between metals and two-dimensional semiconductors. Nat Electron, 2022, 5(4): 241 doi: 10.1038/s41928-022-00746-6
|
| [3] |
Chu C H, Lin H C, Yeh C H, et al. End-bonded metal contacts on WSe2 field-effect transistors. ACS Nano, 2019, 13(7): 8146 doi: 10.1021/acsnano.9b03250
|
| [4] |
Xiao J K, Kang Z, Liu B S, et al. Record-high saturation current in end-bond contacted monolayer MoS2 transistors. Nano Res, 2022, 15(1): 475 doi: 10.1007/s12274-021-3504-y
|
| [5] |
Wang Y, Kim J C, Wu R J, et al. Van der Waals contacts between three-dimensional metals and two-dimensional semiconductors. Nature, 2019, 568(7750): 70 doi: 10.1038/s41586-019-1052-3
|
| [6] |
Wang Y, Kim J C, Li Y, et al. P-type electrical contacts for 2D transition-metal dichalcogenides. Nature, 2022, 610(7930): 61 doi: 10.1038/s41586-022-05134-w
|
| [7] |
Shen P C, Su C, Lin Y X, et al. Ultralow contact resistance between semimetal and monolayer semiconductors. Nature, 2021, 593(7858): 211 doi: 10.1038/s41586-021-03472-9
|
| [8] |
English C D, Shine G, Dorgan V E, et al. Improved contacts to MoS2 transistors by ultra-high vacuum metal deposition. Nano Lett, 2016, 16(6): 3824 doi: 10.1021/acs.nanolett.6b01309
|
| [9] |
Gao L, Chen Z Y, Fang Z H, et al. Atomic layer bonding contacts in two-dimensional semiconductors. Science, 2025, 390(6775): 813 doi: 10.1126/science.adz2405
|
Journal of Semiconductors © 2017 All Rights Reserved 京ICP備05085259號-2